TY - CHAP A1 - Antonio Qualtieri A2 - Tiziana Stomeo A3 - Luigi Martiradonna A4 - Roberto Cingolani A5 - Massimo De Vittorio ED1 - Michael Wang Y1 - 2010-02-01 PY - 2010 T1 - Advances in Resist Materials and Processing Technology: Photonic Devices Fabricated by Direct Lithography of Resist/Colloidal Nanocrystals Blend N2 - Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book. BT - Lithography SP - Ch. 7 UR - https://doi.org/10.5772/8173 DO - 10.5772/8173 SN - PB - IntechOpen CY - Rijeka Y2 - 2022-05-27 ER -