TY - CHAP A1 - Elke Erben A2 - Klaus Hempel A3 - Dina Triyoso ED1 - Kim Ho Yeap ED2 - Humaira Nisar Y1 - 2018-08-01 PY - 2018 T1 - Work Function Setting in High-k Metal Gate Devices N2 - In this book, Complementary Metal Oxide Semiconductor ( CMOS ) devices are extensively discussed. The topics encompass the technology advancement in the fabrication process of metal oxide semiconductor field effect transistors or MOSFETs (which are the fundamental building blocks of CMOS devices) and the applications of transistors in the present and future eras. The book is intended to provide information on the latest technology development of CMOS to researchers, physicists, as well as engineers working in the field of semiconductor transistor manufacturing and design. BT - Complementary Metal Oxide Semiconductor SP - Ch. 3 UR - https://doi.org/10.5772/intechopen.78335 DO - 10.5772/intechopen.78335 SN - 978-1-78923-497-8 PB - IntechOpen CY - Rijeka Y2 - 2021-09-23 ER -