TY - CHAP A1 - Vadim Glebovsky ED1 - Kim Ho Yeap ED2 - Humaira Nisar Y1 - 2018-02-28 PY - 2018 T1 - High-purity Refractory Metals for Thin Film Metallization of VLSI N2 - In this book, a variety of topics related to Very-Large-Scale Integration (VLSI) is extensively discussed. The topics encompass the physics of VLSI transistors, the process of integrated chip design and fabrication and the applications of VLSI devices. It is intended to provide information on the latest advancement of VLSI technology to researchers, physicists as well as engineers working in the field of semiconductor manufacturing and VLSI design. BT - Very-Large-Scale Integration SP - Ch. 4 UR - https://doi.org/10.5772/intechopen.69126 DO - 10.5772/intechopen.69126 SN - 978-953-51-3864-8 PB - IntechOpen CY - Rijeka Y2 - 2021-06-15 ER -