TY - CHAP A1 - Vahid Mohammadi A2 - Stoyan Nihtianov ED1 - Sudheer Neralla Y1 - 2016-08-31 PY - 2016 T1 - Low‚ÄźTemperature PureB CVD Technology for CMOS Compatible Photodetectors N2 - This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations. BT - Chemical Vapor Deposition SP - Ch. 6 UR - https://doi.org/10.5772/63344 DO - 10.5772/63344 SN - 978-953-51-2573-0 PB - IntechOpen CY - Rijeka Y2 - 2021-12-02 ER -