TY - CHAP A1 - Hirofumi Shimizu A2 - Toshikazu Nishide ED1 - Yitzhak Mastai Y1 - 2012-04-27 PY - 2012 T1 - Characterization of Sol-Gel-Derived and Crystallized HfO2, ZrO2, ZrO2-Y2O3 Thin Films on Si(001) Wafers with High Dielectric Constant N2 - Crystallization is used at some stage in nearly all process industries as a method of production, purification or recovery of solid materials. In recent years, a number of new applications have also come to rely on crystallization processes such as the crystallization of nano and amorphous materials. The articles for this book have been contributed by the most respected researchers in this area and cover the frontier areas of research and developments in crystallization processes. Divided into five parts this book provides the latest research developments in many aspects of crystallization including: chiral crystallization, crystallization of nanomaterials and the crystallization of amorphous and glassy materials. This book is of interest to both fundamental research and also to practicing scientists and will prove invaluable to all chemical engineers and industrial chemists in the process industries as well as crystallization workers and students in industry and academia. BT - Advances in Crystallization Processes SP - Ch. 13 UR - https://doi.org/10.5772/35727 DO - 10.5772/35727 SN - PB - IntechOpen CY - Rijeka Y2 - 2019-11-13 ER -