TY - CHAP A1 - Mitsuhiro Horade A2 - Susumu Sugiyama ED1 - Bo Cui Y1 - 2011-12-02 PY - 2011 T1 - Fabrication of 3-D Structures Utilizing Synchrotron Radiation Lithography N2 - Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography. BT - Recent Advances in Nanofabrication Techniques and Applications SP - Ch. 16 UR - https://doi.org/10.5772/24371 DO - 10.5772/24371 SN - PB - IntechOpen CY - Rijeka Y2 - 2021-06-15 ER -