@incollection{Awad18, author = {Ahmed Awad and Atsushi Takahashi and Chikaaki Kodaman}, title = {Optical Proximity Correction (OPC) Under Immersion Lithography}, booktitle = {Micro/Nanolithography}, publisher = {IntechOpen}, address = {Rijeka}, year = {2018}, editor = {Jagannathan Thirumalai}, chapter = {6}, doi = {10.5772/intechopen.72699}, url = {https://doi.org/10.5772/intechopen.72699} }